CVD Diamond:
Microwave Plasma Deposition

Proprietary deposition technology:
Ellipsoidal microwave plasma reactors

For the deposition of CVD diamond wafers several microwave plasma reactors powered with 6 to 12 kW microwave power have been set up. Upscaled versions operating at 915 MHz microwave frequency are used for the production of large area (up to 6") diamond wafers. The design of these microwave plasma reactors is based on numerical simulations. The reactors are optimized with respect to the homogeneous coating of large area substrates with reasonable growth rates.